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Patent name

Method for Forming Nano-bubble

​專利名稱

奈米氣泡之形成方法

Patent family

中華民國:I371426

US 8974770

JP 4933569

Inventor

Walter H. Chang, Cheng-An Lin, Chih-Hsien Lee, Chih-Kuang Yeh

張恒雄、林政鞍 、李志賢、葉秩光

Abstract

The present invention discloses a method for forming a nano-bubble. The forming method is different from the oil-water emulsion reaction in the prior art. The method comprises: taking an inorganic particle as a nucleus and performing a polymer coating process to coat at least one first polymer on the surface of the nucleus to form an organic/inorganic composite particle; then removing the nucleus of the organic/inorganic composite particle by way of the dissolution of a first solvent to form an impregnated nano-particle; performing a freeze-drying process to remove the first solvent to have the impregnated nano-particle form a hollow nano-particle; and finally dissolving the hollow nano-particle in a second solvent to form the nano-bubble.

本發明揭示了一種奈米氣泡之形成方法,上述形成方法有別於習之所使用之油水乳化反應,上述形成方法包含:以一無機粒子作為一核中心,披覆至少一第一高分子於上述核中心之表面以形成一有機/無機複合粒子,其次,藉由一第一溶劑溶解移除上述有機/無機複合粒子之核中心以形成一含劑奈米粒子,接著,進行一冷凍乾燥程序,用以除去上述第一溶劑並使得上述含劑奈米粒子形成一中空奈米粒子,最後,將上述中空奈米粒子溶於一第二溶劑,以形成上述奈米氣泡。

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